Optical Lithography Here Is Why 2nd Edition by Burn Jeng Lin ISBN 9781510639959 1510639950

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Product details:
ISBN 10: 1510639950
ISBN 13: 9781510639959
Author: Burn Jeng Lin

Optical Lithography Here Is Why 2nd Edition Table of contents:

Part I: Fundamentals of Optical Lithography

1. Introduction to Lithography

2. The Role of Lithography in Semiconductor Manufacturing

3. Basic Concepts in Optics

4. Light Sources and Wavelength Considerations

5. Photoresists: Chemistry and Physics

Part II: Imaging and Resolution

6. The Resolution Equation: NA, k₁, and λ

7. Projection Systems and Lenses

8. Depth of Focus and Process Window

9. Aberrations and Optical Limitations

10. Illumination Systems and Source Optimization

Part III: Process Control and Enhancement Techniques

11. Optical Proximity Correction (OPC)

12. Phase-Shift Masks (PSM)

13. Resolution Enhancement Technologies (RET)

14. Anti-Reflective Coatings and Substrate Effects

15. Overlay Control and Alignment Techniques

Part IV: Challenges and Innovations

16. Pattern Fidelity and Line Edge Roughness (LER)

17. Double Patterning and Multiple Exposure Techniques

18. EUV Lithography: Promise and Pitfalls

19. Defects, Inspection, and Yield Considerations

20. Process Integration and Design for Manufacturability (DfM)

Part V: Future Directions and Industry Perspectives

21. Technology Nodes and the Path to Sub-5nm

22. Cost, Complexity, and Lithography Economics

23. Alternative Lithography Methods

24. Sustainability in Lithographic Processes

25. Conclusion: Why Optical Lithography Still Matters

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Tags: Burn Jeng Lin, Optical Lithography, Why