OPTICAL LITHOGRAPHY here is why 2nd Edition Burn Jeng Lin – Ebook Instant Download/Delivery ISBN(s): 9781510639966,1510639969, 9780819481825
Product details:
- ISBN 10: 1510639969
- ISBN 13: 9781510639966
- Author: Burn Jeng Lin
This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.
Burn Lin is editor-in-chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), past chair of the SPIE Advanced Lithography symposium, author of two book chapters and over 88 articles, and holder of 51 U.S. patents. He is a National Academy of Engineering member, SPIE fellow, and IEEE fellow.
Table contents:
CHAPTER 1.Introducing Optical Lithography
CHAPTER 2.Exposure Systems
CHAPTER 3.Image Formation
CHAPTER 4.The Metrics of Lithography
CHAPTER 5.Components in Optical Lithography
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